Advanced Energy 是一個對半導體製造中所使用的高科技製程十分重要之技術進行開發並提供支援的全球領導者。我們的精密而靈活的電源系統、可靠的氣體和液體流動管理系統以及精確的溫度測量儀在多步半導體器件製造中全部被使用，這些製程包括沈積（PVD、CVD、電鍍、ALD）、化學清除（蝕刻、去膜、CMP）和表面改性過程（離子注入、RTP）。

電源系統

流量管理

Source技術

溫度量測儀器

March 26, 2008 - Advances in Radio Frequency Plasma Power Delivery Systems presentation

June 27, 2006 - AE Unveils New Line of Sekidenko Multi-Channel OFTs and Emissometers

May 16, 2006 - AE Awarded Design Win by Leading Provider 

 
Arc Handling in RF-Superimposed DC Processes (2006) application note

Overview of the Use of Copper Interconnects in the Semiconductor Industry (2004) white paper

Performance Considerations of High-Power AC Plasma Deposition Power Supplies (2004) white paper 

Power Supply Topologies (1999) white paper

Beyond Pressure Transients: Using Pressure-Insensitive MFCs to Control Gases In Semiconductor Manufacturing, March 2006 magazine reprint

Powering to better yields, November 2005 magazine reprint

Power Conversion and Control Reduces CoO and Improves Yield, March 2005 magazine reprint

Maximizing tool uptime and process stability through an RF system upgrade, November 2004 magazine reprint

Fabs can ride through voltage sags with power-quality targets, July 2004 magazine reprint

A Novel Frequency-Domain Small-Signal Analysis of Resonant Power Converters, July 2004 magazine reprint

Partial Pressure Control in Reactive Sputtering, June 2004 magazine reprint

A Novel Pulsed Supply With Arc Handling and Leading Edge Control, April 2004 magazine reprint

High Power Pulsed Reactive Sputtering of Zirconium Oxide and Tantalum Oxide, April 2004 magazine reprint

Reactive Sputter Deposition of Aluminum Oxide Coatings, April 2004 magazine reprint

Effective Closed-Loop Control for Reactive Sputtering Using Two Reactive Gases, April 2004 magazine reprint

Stabilizing RF Generator and Plasma Interactions, April 2004 magazine reprint

Optimising performance by integrating RF power and match technologies, December 2007/January 2008 magazine reprint

Used Equipment data sheet